رسوب لایه اتمی: اصول ویژگی ها و کاربردهای فناوری نانو، ویرایش دوم Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications, Second Edition
- نوع فایل : کتاب
- زبان : انگلیسی
- نویسنده : Tommi Kaariainen ,David Cameron ,Marja?Leena Kaariainen ,Arthur Sherman(auth.)
- چاپ و سال / کشور: 2013
- شابک / ISBN : 9781118062777, 9781118747407
Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.Content: Chapter 1 Fundamentals of Atomic Layer Deposition (pages 1–31): Chapter 2 Elemental Semiconductor Epitaxial Films (pages 33–49): Chapter 3 III?V Semiconductor Films (pages 51–66): Chapter 4 Oxide films (pages 67–159): Chapter 5 Nitrides and Other Compounds (pages 161–182): Chapter 6 Metals (pages 183–206): Chapter 7 Organic and Hybrid Materials (pages 207–213): Chapter 8 ALD Applications and Industry (pages 215–242):
